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21/30433862 DC
M00000029
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28 April 2021 BS ISO 17109 AMD1. Surface chemical analysis. Depth profiling. Method for sputter rate determination in X-ray photoelectron spectroscopy, Auger electron spectroscopy and secondary-ion mass spectrometry sputter depth profiling using single and multi-layer thin films
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Surfaces, Depth, Chemical analysis and testing, Thin films, Photoelectron spectroscopy, Measurement, X-ray photoelectron spectroscopy, Auger electron spectroscopy, Calibration, Analysis, Films (states of matter), Spectroscopy, Ions